Products

Trifluorochloromethane (CClF₃) Electronic/EL Grade

    • Product Name: Trifluorochloromethane (CClF₃) Electronic/EL Grade
    • Chemical Name (IUPAC): Trichlorofluoromethane
    • CAS No.: 75-72-9
    • Chemical Formula: CClF3
    • Form/Physical State: Compressed Gas
    • Factroy Site: Yuanbaoshan District, Chifeng City, Inner Mongolia, P.R. China
    • Price Inquiry: sales7@alchemist-chem.com
    • Manufacturer: Inner Mongolia Eppen Biotech Co., Ltd.
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    Specifications

    HS Code

    712254

    Chemical Name Trifluorochloromethane
    Chemical Formula CClF3
    Molecular Weight 104.46 g/mol
    Cas Number 75-72-9
    Purity El Grade ≥99.999%
    Physical State Gas at room temperature
    Boiling Point -81.4°C
    Melting Point -155°C
    Density At 25 C 1.495 g/cm³ (liquid)
    Vapor Pressure At 20 C 8.77 bar
    Refractive Index 1.227 (liquid at -90°C)
    Solubility In Water 16 mg/L at 25°C
    Global Warming Potential Gwp 11,700 (100 year time horizon)
    Odor Faintly ether-like
    Un Number 918

    As an accredited Trifluorochloromethane (CClF₃) Electronic/EL Grade factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Trifluorochloromethane (CClF₃) Electronic/EL Grade is supplied in a 49-liter high-pressure steel cylinder with secure valve cap.
    Container Loading (20′ FCL) 20′ FCL container loaded with high-purity Trifluorochloromethane (CClF₃) Electronic/EL Grade, securely packaged in ISO tanks for safe transport.
    Shipping Trifluorochloromethane (CClF₃) Electronic/EL Grade is shipped as a compressed, liquefied gas in high-pressure cylinders certified for hazardous materials. Cylinders are clearly labeled, fitted with secure valves, and accompanied by safety data documentation. Transport complies with local, national, and international regulations for hazardous gases to ensure safe and secure delivery.
    Storage Trifluorochloromethane (CClF₃) Electronic/EL Grade should be stored in tightly sealed, corrosion-resistant cylinders in a cool, dry, well-ventilated area away from heat, direct sunlight, and incompatible materials such as alkali metals. Cylinders must be secured upright and protected from physical damage. Use only in areas with proper ventilation and leak detection. Store according to local and national regulations for compressed gases.
    Shelf Life Trifluorochloromethane (CClF₃) Electronic/EL Grade has an indefinite shelf life when stored in tightly sealed containers under recommended conditions.
    Application of Trifluorochloromethane (CClF₃) Electronic/EL Grade

    Purity 99.999%: Trifluorochloromethane (CClF₃) Electronic/EL Grade with Purity 99.999% is used in semiconductor plasma etching processes, where ultra-high purity ensures minimal contamination and precise circuit patterning.

    Low Moisture Content: Trifluorochloromethane (CClF₃) Electronic/EL Grade with Low Moisture Content is used in thin film deposition applications, where controlled moisture levels enhance film uniformity and electrical performance.

    Stability Temperature -150°C: Trifluorochloromethane (CClF₃) Electronic/EL Grade with Stability Temperature -150°C is used in cryogenic cooling systems for electronics manufacturing, where thermal stability guarantees equipment protection during rapid temperature changes.

    Critical Impurity ≤ 1 ppm: Trifluorochloromethane (CClF₃) Electronic/EL Grade with Critical Impurity ≤ 1 ppm is used in LCD production environments, where low impurity concentration reduces risk of pixel defects.

    Molecular Weight 104.46 g/mol: Trifluorochloromethane (CClF₃) Electronic/EL Grade with Molecular Weight 104.46 g/mol is used in microelectronic cleaning processes, where optimal molecular size enhances removal efficiency of particulates and residues.

    High Gas Phase Stability: Trifluorochloromethane (CClF₃) Electronic/EL Grade with High Gas Phase Stability is used in photovoltaic cell fabrication, where gas stability ensures consistent plasma characteristics and reproducible layer quality.

    Free Quote

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    Certification & Compliance
    More Introduction

    Introducing Trifluorochloromethane (CClF₃) Electronic/EL Grade: Manufacturer’s Perspective

    What Sets Our Electronic/EL Grade Trifluorochloromethane Apart

    At our plant, years of hands-on chemical production have shown us that simple things can make or break a factory’s reputation. Trifluorochloromethane, known as CClF₃, remains one of those materials that sparks debate in the world of specialty gases. We call it Electronic/EL Grade not for marketing effect, but as a commitment born from real production standards. Each batch we produce is intended for one purpose: enabling fault-free results in high-precision electronic manufacturing.

    What makes a gas “Electronic/EL Grade” is more than a simple label—it reflects purity, consistency, and low contaminant levels measured down to parts per billion. Ambient air always challenges us, with traces of moisture, particulates, or metallic ions. So, we put a large focus on analytical controls and sealed handling to prevent contamination at every stage, from distillation through to packaging. Our technicians know the impact that one part per million of residue can cause—in some applications, a single impurity can ruin weeks’ worth of wafer work. As a result, the stakes remain high not just for us as a manufacturer, but for the hundreds of engineers relying on these gases to keep lines productive and circuit yields high.

    Typical Applications in Electronics Manufacturing

    You will not find this material in magazines or on flashy resale sites; you will find it deep inside semiconductor fab cleanrooms. Over the years, CClF₃ has proven irreplaceable as a plasma etchant—especially in dry-etch processes for silicon dioxide and silicon nitride layers. We see it requested frequently for production of integrated circuit die, flat panel displays, MEMS sensors, and solar photovoltaic cells.

    Our partners tell us that its selectivity and isotropic etching behavior allow better control in micro-patterning steps, especially compared to lighter analogs. Some processes have switched from hexafluoroethane or other halocarbons, citing the cleaner profiles and manageable etch rates associated with properly produced CClF₃. Sitting at the intersection of chemistry and technology, the gas finds its niche in the balance between aggressive action in removing material and maintaining the resolution that nanometer-scale devices demand.

    Purity as a Measure of Manufacturing Integrity

    Customers expect certainty, not guesswork. For this application, CClF₃ in EL Grade must exceed 99.99% purity—or what most labs call “four nines-plus.” That’s not merely a number. Our in-line gas chromatographs run non-stop to verify levels of moisture, hydrocarbons, acids, fixed gases, and reactive metals before cylinder filling. Any reading outside the strictest limits leads to immediate batch rejection.

    We see other industrial grades of trifluorochloromethane available, usually targeting refrigeration or propellant markets. These grades may tolerate higher levels of chlorides, acids, or trace lubricants. Fabricators can accept some risk of residue in those end uses, but nobody producing microchips can. In our process, we install moisture traps, distillation columns with specialized packings, and in-house built purification reactors to keep these side-products at bay, setting our material apart from commodity offerings.

    Packaging and Handling: Not an Afterthought

    Each year, the need for tighter controls increases. Our team assembles and certifies each cylinder on-site, using only orbital-welded stainless steel vessels. Prior to filling, all packages undergo a triple-evacuation process and helium leak testing, which lets us keep out any last traces of contamination. Regulators, pressure-relief devices, and valves get selected not just for chemical compatibility, but for trace-level cleanliness.

    Cleanroom delivery sometimes requires special protocols, including secondary containment and tamper-evident seals. Experience has shown us that even the best batch of gas can become unusable if packaging introduces contaminants at the final stage. We collaborate directly with end users to fine-tune packaging sizes—from lecture bottles for pilot lines to high-volume drum tanks feeding 24-hour production. Each selection aims for safety, convenience, and peace of mind for process engineers as much as for our own QA staff.

    Tracking Global Shifts in the Electronic Gases Market

    In countries with emerging fabs, the search for reliable sources of high-purity etchant gases has outpaced local supply. Export controls and stringent regulations have tightened, changing the way manufacturers like us must manage raw materials, transportation, and customer support. For us, traceability and accountability have become as important as chemical properties. Every batch receives a full suite of analytical certificates, lot trace codes, and real-time digital backups. These aren’t just bureaucratic hurdles—they form the backbone of long-term trust in an industry where a process stop costs thousands by the minute.

    We stay alert to news of supply chain shocks, new environmental agreements, or best practices laid down by leading chip producers. By investing in our analytical toolkit and keeping close communication with inspection agencies, our facility maintains its edge—not just in meeting government benchmarks, but in exceeding customer expectations for safety and compliance. Years of learning have taught us that trends in chip design or government policies can shift quickly, and adaptation is never optional.

    High Standards Informed by Real-World Manufacturing

    Many years ago, in the early days of our operation, the idea of delivering 99.995% pure trifluorochloromethane sounded out of reach. Instruments missed tiny impurities now caught in today’s process controls. Shortages of fine-grade calcium carbonates or Teflon gaskets caused defects that took months to track down. Today, steady investment lets us pursue sub-ppm impurity detection with greater confidence, and teams dedicate whole shifts just to packaging audits.

    Feedback loops close the gap between theory and reality. If an engineer in a chip plant detects an anomaly—say, a drift in plasma uniformity after many hours of etching—we collaborate to backtrack the issue, using our archived analytical records and packaging histories. Insights from this back-and-forth guide continuous improvement, from the design of new traps and filters to tweaks in cylinder pre-conditioning. We don’t publish these lessons, but they live in the ever-evolving set of protocols used by both old hands and new hires on our production floors.

    Benefits for Process Efficiency and Yield

    Reducing process variability matters as much as absolute performance. In plasma etching tools, gas-phase inputs must remain stable not just for a few runs, but across thousands of production cycles. Laboratory trials using our EL Grade trifluorochloromethane have led to reduced photomask undercutting, less polymer deposition inside reaction chambers, and lower rates of equipment downtime from contamination.

    We work closely with line engineers adjusting parameters like RF power, substrate temperature, or gas flow ratios. Small shifts in feed-gas composition can force broad changes in process ratios down the line, increasing waste and cost. Over years, these partnerships refine our practices, so downstream yield improvements can be directly tied to the reliability of inputs, not just the skill of operators at the receiving site.

    A customer-focused approach also means providing full traceability and advice on safe storage and feed-line practices. Many performance issues come from outside the factory; by sharing our field-tested packaging tips and helping facilities audit their own gas handling rooms, we help minimize both technical and regulatory risks.

    Comparing CClF₃ to Other Plasma Etchant Gases

    Every fab prefers its own favorite gases for recipe balance. Trifluorochloromethane stands apart from more common fluorocarbons like CF₄ or C₂F₆ not just in chemical composition, but in practical outcomes. Its chlorine atom enables alternative reaction paths during etching, which gives better selectivity towards silicon-based films. Though more reactive than fully fluorinated options, CClF₃ remains less aggressive than certain alternatives—reducing sub-surface damage to sensitive photoresists or dielectric stacks.

    We have observed that some customers use our CClF₃ alongside fluorine-heavy blends to tune etch ratios and vertical wall angles where higher anisotropy matters. Where particle contamination or risk of polymer buildup is a concern, the controlled reactivity of our EL Grade product delivers clear returns in reduced post-process cleaning. Unlike bulk refrigerant grades, our specialty process avoids the cross-contaminants and lubricants sometimes present in mass-market cylinders, ensuring our customers can maintain longer service intervals for critical equipment.

    Managing Environmental and Safety Challenges

    Decades in the business make it clear that environmental concerns no longer take a back seat to performance. Trifluorochloromethane, like other halocarbons, does present global warming and ozone-depletion risks if mismanaged. As a manufacturer, we invest heavily in closed-loop recovery systems and leak-prevention training for staff. Rather than shipping gas to customers and forgetting the outcome, we offer reclamation services and guidance on end-of-life abatement.

    Manufacturing processes now often include real-time emissions monitoring and auditing, helping to flag fugitive releases before they become liabilities. Our teams have taken part in regional pilot projects aimed at reducing greenhouse emissions, and we maintain close ties with regulatory agencies and environmental watchdogs to keep our practices responsible. Simple practices—double-checked valve integrity, mandatory secondary containment, rapid-response leak kits—make a measurable difference both to community air quality and to clients’ downstream compliance.

    At the shop floor level, we enforce personal protective equipment and spill control procedures. Each staff member gets training suited not just to handling, but to understanding the full impact of a gas escape or improper venting. This culture of attentiveness pays dividends in preventing both accidents and regulatory fines, and helps customers feel more secure when accepting shipments from our plant.

    Continual Learning and Customer Collaboration

    Every production cycle, the industry asks for smaller nodes, tighter ratios, and sharper edges. R&D groups on our side work directly with customer process engineers. Not all applications call for the highest grades, and some customers benefit from tailored analysis or additional filtration stages. Honest feedback, even about minor issues like valve torque or residual tools compatibility, drives our development teams forward.

    Innovation seldom comes from within a boardroom. It’s the daily troubleshooting, spare part swaps, and late-night calls with facilities managers that teach us where the true bottlenecks emerge. Some of our strongest improvements came from following up on small reliability issues reported by a single operator—later discovered to affect multiple lines in different fabs. Regular site visits, shared audit results, and even informal conversations after rounds of process validation foster transparency and sustained improvement.

    Looking to the Future

    We see the coming decade demanding even stricter purity, smarter analytical equipment, and closer integration between gas makers and device fabricators. As wafer geometries shrink, so do the acceptable margins for error. Our lab plans to trial next-generation impurity analyzers capable of detecting new classes of trace residues—especially those that may interfere with advanced lithography chemistries or exotic substrate coatings.

    If customers begin to pursue demand for circular supply—the reclamation and re-refinement of expired cylinders—we stand ready to invest in the supporting infrastructure. Many trends taking shape today will redefine how electronic materials are sourced and managed, and being adaptable means keeping both our chemical expertise and our operations nimble, secure, and transparent. On the ground, it means line supervisors, analytical chemists, packaging specialists, and service techs working as one organism.

    Summary of Real-World Value

    In the world of electronic gases, consistency brings customers back year after year. Our history with CClF₃ speaks to lessons learned, obstacles overcome, and investments made both in equipment and in people. Electronic/EL Grade is not just our product line; it’s the result of decades of improvement, built on the backs of challenges faced in real facilities. We take pride in offering gas that meets today’s toughest demands, and in learning, every cycle, how to raise the bar that much higher.

    For anyone working at the intersection of chemistry and electronics fabrication, trust grows from a manufacturer’s willingness to listen, respond, and innovate. Our journey with trifluorochloromethane continues to evolve side by side with our customers' goals—helping turn technical challenges into reliable outcomes.